Tuesday, May 16, 2017

Hafnia dons a new face

05/16/2017 12:59 PM EDT

nanorod surfaces and twin boundary defects

As computer chips become smaller, faster and more powerful, their insulating layers must also be much more robust--currently a limiting factor for semiconductor technology. A collaborative University of Kentucky-Texas A&M University research team says this new phase of hafnia is an order of magnitude better at withstanding applied fields.


Full story at https://uknow.uky.edu/research/hafnia-dons-new-face

Source
University of Kentucky


This is an NSF News From the Field item.


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