A simple method etches patterns at the atomic scale

A simple method etches patterns at the atomic scale 05/01/2018 04:55 PM EDT A precise, chemical-free method for etching nanoscale features on silicon wafers has been developed by a team from Penn State and Southwest Jiaotong University and Tsinghua University in China. Full story at http://news.psu.edu/story/518679/2018/04/26/simple-method-etches-patterns-atomic-scale Source The Pennsylvania State University This is an NSF News From the Field item. Follow NSF:  This email was sent using GovDelivery Communications Cloud on behalf of: National Science Foundation Update · 2415 Eisenhower Avenue, Alexandria, VA 22314 · 703-292-5111